Command Reference Library: Difference between revisions

Latest revision as of 19:48, 18 June 2020

Command Conventions

Some basic ideas on how commands work and are used.

Conventions

Grid Commands

Commands to control grid generation and refinement.

fs creating and control of new fieldservers - expert use only!
line - Controls placement of gridlines for rectilinear meshes
region - Allows rectangular materials to be created
init - Initializes the grid structure from rectangular commands or a saved file
struct - Allows the grid and solution values to be saved or read from a file
Smooth - smooths the grid and attempts to make equilaterial elements
grid - access to many grid information / manipulation actions

Post Processing Commands

Commands to analyze data.

Post Processing Commands

Most common post processing commands:

Alagator

Alagator Starting Place and Tutorial

Alagator is the scripting language that was developed as a way for FLOOXS users to easily control the physics in their simulations. This is where the real power of FLOOXS lies. These commands allow the user to easily set up a set of common process or semiconductor device equations. For example, the scripting language has multiple components that are called during the execution of a diffusion command. The basic element is a description of a differential equation.

Alagator Language Description, A description of the recognized keywords and symbols in building an equation.
Alagator Tutorial, Tutorial examples that help users get started.

Alagator Commands

pdb These control the access and values in the parameter database.
mater Control the materials and their names
solution Create and control solutions

Application Specific Commands

Commands to solve systems of equations, deposit materials, and more!

Process Commands

deposit The deposit command allows new material to be deposited on the wafer surface. This command is all new for the 2002 release.
diffuse Simulate all types of thermal steps, including anneals, oxidations, and silicidations.
rta This is a simplified interface to the diffuse command and temperature ramps for rta anneals.
etch This command is used with a specific etch to evolve the surface according to the type of etching specified.
furnace This is a simplified interface to the diffuse command for furnace anneals.
implant Implant a dopant and add it to the existing distributions.
mask This command is used to create a mask. It can be used subsequently with an implant or etch command..
strip This command removes a specified surface material in its entirety.

Device Commands

contact This command allows contacts to be added to an existing structure. It can also be used to fetch contact information - like current.
device This is the main simulation command and supports DC, AC, and noise analysis.

Other Commands

Miscellaneous commands that aren't really categorizable. There are many useful commands here!

profile This allows the reading in of a one-dimensional profile
math Controls the numerical analysis options - not for the faint hearted

@@ Line 19: / Line 19: @@
 Most common post processing commands:
 * [[SelectCommand|select]]
-* [[Plot.1dCommand|plot.1d]]
+* [[WindowCommand|window]]
-* [[Plot.2dCommand|plot.2d]]
+* [[PenCommand|pen]]
-* [[ContourCommand|contour]]
+* [[Plot.1dCommand|plot1d]]
+* [[Plot.2dCommand|plot2d]]
+* [[Plot3dCommand|plot3d]]
+* [[ChartCommand|chart]]
+==Alagator==
+===Alagator Starting Place and Tutorial===
+Alagator is the scripting language that was developed as a way for FLOOXS users to easily control the physics in their simulations. This is where the real power of FLOOXS lies. These commands allow the user to easily set up a set of common process or semiconductor device equations. For example, the scripting language has multiple components that are called during the execution of a diffusion command. The basic element is a description of a differential equation.
+* [[Alagator Language Description]], A description of the recognized keywords and symbols in building an equation.
+* [[Alagator Tutorial]], Tutorial examples that help users get started.
+===Alagator Commands===
+*[[pdbCommands | pdb]] These control the access and values in the parameter database.
+*[[materCommand | mater]] Control the materials and their names
+*[[solutionCommand | solution]] Create and control solutions
 ==Application Specific Commands==
@@ Line 29: / Line 43: @@
 *[[DepositCommand | deposit]] The deposit command allows new material to be deposited on the wafer surface. This command is all new for the 2002 release.
 *[[Diffuse Command | diffuse]] Simulate all types of thermal steps, including anneals, oxidations, and silicidations.
+*[[Rta_Command | rta]] This is a simplified interface to the diffuse command and temperature ramps for rta anneals.
 *[[Etch Command | etch]] This command is used with a specific etch to evolve the surface according to the type of etching specified.
 *[[Furnace Command | furnace]] This is a simplified interface to the diffuse command for furnace anneals.
 *[[Implant Command | implant]] Implant a dopant and add it to the existing distributions.
 *[[Mask Command | mask]] This command is used to create a mask. It can be used subsequently with an implant or etch command..
-*[[Rta_Command | rta]] This is a simplified interface to the diffuse command and temperature ramps for rta anneals.
 *[[Strip Command | strip]] This command removes a specified surface material in its entirety.
@@ Line 44: / Line 58: @@
 *[[profileCommand | profile]] This allows the reading in of a one-dimensional profile
 *[[mathCommand | math]] Controls the numerical analysis options - not for the faint hearted
-*[[pdbCommands | pdb]] These control the access and values in the parameter data base.