File:Gaussian Implant Profile.png: Revision history

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5 May 2015

  • curprev 15:5515:55, 5 May 2015Maddie talk contribs 191 bytes +191 Process Examples - Simple Diode Implant Profile of silicon diode with a constant p-type doping of 1e16 and an n-type Gaussian w/ peak concentration of 1.0e20 and a junction depth of 0.1um.