File:Gaussian Implant Profile.png

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Gaussian_Implant_Profile.png(570 × 577 pixels, file size: 25 KB, MIME type: image/png)

Process Examples - Simple Diode

Implant Profile of silicon diode with a constant p-type doping of 1e16 and an n-type Gaussian w/ peak concentration of 1.0e20 and a junction depth of 0.1um. 

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current15:55, 5 May 2015Thumbnail for version as of 15:55, 5 May 2015570 × 577 (25 KB)Maddie (talk | contribs)Process Examples - Simple Diode Implant Profile of silicon diode with a constant p-type doping of 1e16 and an n-type Gaussian w/ peak concentration of 1.0e20 and a junction depth of 0.1um. 

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