File:1100 C for 10 mins Part 2.png
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Model Development Solutions Part 2
Implant profile for Carbon diffusion in Silicon at 1100 degrees Celsius for 10 minutes
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 17:15, 5 May 2015 | | 520 × 532 (48 KB) | Maddie (talk | contribs) | Model Development Solutions Part 2 Implant profile for Carbon diffusion in Silicon at 1100 degrees Celsius for 10 minutes |
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