1D Implant and Diffusion

A common example is to estimate a junction depth after annealing.

line x loc=0.0 spac=0.001 tag=Top
line x loc=0.7 spac=0.001 
line x loc=1.0 spac=0.01 tag=Bottom
region silicon xlo=Top xhi=Bottom 
init

For this example, we want a very fine grid near the top of the wafer. We also do not need to have a very deep simulation space.

There is a line at 0.0um which is tagged Top and will have a spacing of 10Å. The spacing is kept constant down to 0.7um. So this should be fine for most shallow (and not so shallow) junctions technologies. The spacing is allowed to increase to 100Å at 1um. This line is tagged Bottom. The entire region from Top to Bottom is defined to be silicon. The init command initializes the grid and creates all of the nodes and edges.