Download
Please make sure to complete the license and obtain the password. The password will be necessary to open the zip file that will download.
Copyright and Redistribution
This software and manual is copyrighted by the Mark Law, University of Florida Electrical and Computer Engineering department. It is intended for internal educational and research and development purposes only. Any use of any part of this software in any commercial package needs to be negotiated separately. Several of the implant models are copyrighted by Al Tasch from The University of Texas at Austin. It uses public domain software tcl/tk and various linear algebra packages.
Authorization for Download of 2008
This version is best if you wish to do Si process simulation - implant, diffusion, shallow junction formation. To obtain the 2008 release, you must complete the license form scan/email it to Dr. Mark E. Law at law at ece dot ufl dot edu.
This release is best for users interested in simulating silicon processing. It is fairly robust in 2D and buggy in 3D. To obtain the 2008 release, you must complete the license form and email it to Dr. Mark E. Law at mlaw at ufl.edu.
http://www.flooxs.ece.ufl.edu/rel2008.zip
Authorization for Download of 2011
This version is best if you wish to simulate device / sensor performance. To obtain the 2011 release, you must complete the license form andscan/email it to Dr. Mark E. Law at law at ece dot ufl dot edu.
This release is best for users interested in simulating device behavior, particularly coupled with multi-physics. It is fairly robust in 2D and buggy in 3D. To obtain the 2011 release, you must complete the license form and email it to Dr. Mark E. Law at mlaw at ufl.edu.