Device Tutorial: Difference between revisions

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(New page: It will be most helpful to review these in order, as concepts are introduced in increasing complexity, and each example builds off the previous example. == 1D - Introducing the grid and ...)
 
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* [[PMOS capacitor example (3D)]]
* [[PMOS capacitor example (3D)]]
* [[NMOS example (3D)]]
* [[NMOS example (3D)]]
== Single-Event Effects ==
* [[Single-Event Effects Examples]]
== Other Useful Resources ==
The MIT "Well-Tempered" Bulk-Si MOSFET website has useful information (doping profiles, dimensions, etc.) for technology nodes of 90-nm and smaller.
* [http://www-mtl.mit.edu/researchgroups/Well/ "Well-Tempered" MOSFET]
The International Technology Roadmap for Semiconductors (ITRS)
* [http://www.itrs.net/reports.html ITRS Reports]

Revision as of 17:53, 9 November 2010

It will be most helpful to review these in order, as concepts are introduced in increasing complexity, and each example builds off the previous example.


1D - Introducing the grid and the basic device equations and boundary conditions

2D - Introducing advanced models for BJT's, 2DEG issues for MOS, and the Gas

3D - TecPlot, your computer's limitations, and the Quasi-Fermi Method