Ashish Kumar
Ashish Kumar-2013 ashishk@ufl.edu
Process Simulations
-Nickel Silicide Growth Modeling. -Dopant segregation using chemical Potential. -Stress and Strain simulations
Ashish Kumar-2013 ashishk@ufl.edu
Process Simulations
-Nickel Silicide Growth Modeling. -Dopant segregation using chemical Potential. -Stress and Strain simulations