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Ashish Kumar-2013 ashishk@ufl.edu
Ashish Kumar -2013- ashishk@ufl.edu


Process Simulations
Process Simulations


-Nickel Silicide Growth Modeling.
*Nickel Silicide Growth Modeling.
-Dopant segregation using chemical Potential.
*Dopant segregation using chemical Potential.
-Stress and Strain simulations
*Stress and Strain simulations

Revision as of 16:59, 22 January 2014

Ashish Kumar -2013- ashishk@ufl.edu

Process Simulations

  • Nickel Silicide Growth Modeling.
  • Dopant segregation using chemical Potential.
  • Stress and Strain simulations