Process Tutorial: Difference between revisions
No edit summary |
No edit summary |
||
Line 4: | Line 4: | ||
==Process Steps== | ==Process Steps== | ||
Each step in the device fabrication process is modeled by a FLOOPS command that uses the LevelSet method to compute the structure. Once the structure is computed a new mesh is generated and another process step can be applied to the mesh. Each command will be explained and an example will be given. | Each step in the device fabrication process is modeled by a FLOOPS command that uses the LevelSet method to compute the structure. Once the structure is computed a new mesh is generated and another process step can be applied to the mesh. Each command will be explained and an example will be given. | ||
===Base Layer and Gas== | |||
In order to preform any device fabrication we need to start with a base layer. This base layer can be a silicon wafer, oxide, or some other material that thin films can be processed on. To begin modeling another material called Gas is needed. Gas is a region of the mesh that allows FLOOPS to keep track of some region outside the base layer. To create these two materials run the following commands: | |||
line x loc=-1.5 spac=0.1 tag=GasTop | |||
line x loc=0.0 spac=0.1 tag=Top | |||
line x loc=1.0 spac=0.1 tag=Bottom | |||
line y loc=-2.0 spac=0.1 tag=Left | |||
line y loc=2.0 spac=0.1 tag=Right | |||
region gas xlo=GasTop xhi=Top ylo=Left yhi=Right | |||
region Silicon xlo=Top xhi=Bottom ylo=Left yhi=Right | |||
init |
Revision as of 15:05, 17 June 2019
FLOOPS is the subset of FLOOXS that deals with process modeling of electronic devices. This page serves as an introduction to the commands and concepts used by FLOODS to model electronic device fabrication. The goal of process modeling is to use physics informed models to predict how different process parameters change the structure of electronic devices .
Process Steps
Each step in the device fabrication process is modeled by a FLOOPS command that uses the LevelSet method to compute the structure. Once the structure is computed a new mesh is generated and another process step can be applied to the mesh. Each command will be explained and an example will be given.
=Base Layer and Gas
In order to preform any device fabrication we need to start with a base layer. This base layer can be a silicon wafer, oxide, or some other material that thin films can be processed on. To begin modeling another material called Gas is needed. Gas is a region of the mesh that allows FLOOPS to keep track of some region outside the base layer. To create these two materials run the following commands:
line x loc=-1.5 spac=0.1 tag=GasTop line x loc=0.0 spac=0.1 tag=Top line x loc=1.0 spac=0.1 tag=Bottom line y loc=-2.0 spac=0.1 tag=Left line y loc=2.0 spac=0.1 tag=Right region gas xlo=GasTop xhi=Top ylo=Left yhi=Right region Silicon xlo=Top xhi=Bottom ylo=Left yhi=Right init